Description
Semiconductor equipment. Valid Time: Subject to prior sale without notice. These items are only for end user.
| 178 | Kokusai Electric Co., Ltd | Zestone-V(B) DJ-1205V | Vertical Furnace |
| 179 | Kokusai Electric Co., Ltd | Zestone-V(B) DD-1205V | Vertical Furnace |
| 180 | Kokusai Electric Co., Ltd | Zestone-V(B) DD-1205V | Vertical Furnace |
| 181 | Kokusai Electric Co., Ltd | Zestone-III(C) DJ-1223V | Vertical Furnace |
| 182 | Kokusai Electric Co., Ltd | Quixace II Nitride | Vertical Furnace |
| 183 | Kokusai Electric Co., Ltd | Quixace II Nitride | Vertical Furnace |
| 184 | Kokusai Electric Co., Ltd | Quixace II Nitride | Vertical Furnace |
| 185 | Kokusai Electric Co., Ltd | Quixace II Nitride | Vertical Furnace |
| 186 | Kokusai Electric Co., Ltd | Quixace II Nitride | Vertical Furnace |
| 187 | Kokusai Electric Co., Ltd | Quixace II Nitride | Vertical Furnace |
| 188 | Kokusai Electric Co., Ltd | Quixace II Nitride | Vertical Furnace |
| 189 | Kokusai Electric Co., Ltd | Quixace II Nitride | Vertical Furnace |
| 190 | Kokusai Electric Co., Ltd | Quixace Nitride | Vertical Furnace |
| 191 | Kokusai Electric Co., Ltd | Quixace II Nitride | Vertical Furnace |
| 192 | Kokusai Electric Co., Ltd | Quixace Ultimate ALD SiN | Vertical Furnace |
| 193 | Kokusai Electric Co., Ltd | Quixace Ultimate ALD SiN | Vertical Furnace |
| 194 | Kokusai Electric Co., Ltd | Quixace Ultimate ALD SiN | Vertical Furnace |
| 195 | Kokusai Electric Co., Ltd | Zestone-III: DD-1223V | Vertical Furnace |
| 196 | Kokusai Electric Co., Ltd | Quixace Ultimate ALD SiN | Vertical Furnace |
| 197 | Kokusai Electric Co., Ltd | Quixace II Nitride | Vertical Furnace |
| 198 | Kokusai Electric Co., Ltd | Quixace Ultimate ALD SiN | Vertical Furnace |
| 199 | Kokusai Electric Co., Ltd | Quixace Ultimate ALD SiN | Vertical Furnace |
| 200 | Kokusai Electric Co., Ltd | Quixace Ultimate ALD SiN | Vertical Furnace |
| 201 | Kokusai Electric Co., Ltd | Quixace II Doped Poly | Vertical Furnace |
| 202 | Kokusai Electric Co., Ltd | Quixace II Doped Poly | Vertical Furnace |
| 203 | Kokusai Electric Co., Ltd | Quixace II Doped Poly | Vertical Furnace |
| 204 | Kokusai Electric Co., Ltd | Quixace II Nitride | Vertical Furnace |
| 205 | Kokusai Electric Co., Ltd | Quixace Nitride | Vertical Furnace |
| 206 | LAM Research | 2300 Exelan Flex EX+ | Dielectric Etch |
| 207 | LAM Research | 2300 Exelan Flex EX | Dielectric Etch |
| 208 | LAM Research | 2300 Exelan Flex EX+ – Chamber Only | Dielectric Etch |
| 209 | LAM Research | 2300 Exelan Flex EX+ | Dielectric Etch |
| 210 | LAM Research | 2300 Exelan Flex – Chamber Only | Dielectric Etch |
| 211 | LAM Research | TCP 9600CFE | Metal Etch |
| 212 | LAM Research | 2300 Exelan Flex | Dielectric Etch |
| 213 | LAM Research | Rainbow 4720 | Metal Etch |
| 214 | LAM Research | 2300 Exelan Flex | Dielectric Etch |
| 215 | LAM Research | 2300 Exelan | Dielectric Etch |
| 216 | LAM Research | 2300 Exelan | Dielectric Etch |
| 217 | LAM Research | 2300 Exelan Flex FX | Dielectric Etch |
| 218 | LAM Research | 2300 Exelan Flex FX | Dielectric Etch |
| 219 | LAM Research | 2300 KIYO MCX | Metal Etch |
| 220 | Leica Inc. | INS10 | Microscope |
| 221 | Leica Inc. | INM20 | Microscope |
| 222 | Mattson Technology, Inc. | Aspen III ICP | Stripper/Asher |
| 223 | Mattson Technology, Inc. | Aspen III ICP | Stripper/Asher |
| 224 | miscellaneous furniture | Office Tables and Chairs | Office |
| 225 | Mitsubishi | DWC-90 | Wire EDM (Electrical Discharge Machine) |
| 226 | MPI Corporation | LEDA P6801 | LED Die Prober |
| 227 | MSI | N210-MD1G/D3 | Graphics Cards |
| 228 | MSI | GT 710-1GD3H LP | Graphics Cards |
| 229 | Muratec Murata Machinery, Ltd. | SRC330 | Wafer Stocker |
| 230 | Nikon | AMI-3300 | Macro-Defect |
| 231 | Nikon | AMI-3300 | Macro-Defect |
| 232 | Nikon | OPTIPHOT 200C | Microscope |
| 233 | Nikon | AMI-3500 | Macro-Defect |
| 234 | Nikon | OPTIPHOT 200C | Microscope |
| 235 | Nikon | OPTISTATION V | Optical Review System |
| 236 | Nikon | OPTISTATION V | Optical Review System |
| 237 | Nikon | OPTISTATION 3100 | Optical Review System |
| 238 | Nikon | OPTISTATION 3100 | Optical Review System |
| 239 | Nordson Asymtek | S2-930 | Adhesive Dispenser |
| 240 | Nordson Asymtek | S2-930 | Adhesive Dispenser |
| 241 | Novellus Systems Inc. | Concept Three Altus Max EFX | WCVD (Chemical Vapor Deposition) |
| 242 | Novellus Systems Inc. | GAMMA Express | Stripper/Asher |
| 243 | Novellus Systems Inc. | GAMMA Express | Stripper/Asher |
| 244 | Novellus Systems Inc. | VECTOR SOLA UV Cure | PECVD (Chemical Vapor Deposition) |
| 245 | Novellus Systems Inc. | GAMMA Express | Stripper/Asher |
| 246 | Novellus Systems Inc. | GAMMA Express | Stripper/Asher |
| 247 | Novellus Systems Inc. | Concept Three Altus Max | WCVD (Chemical Vapor Deposition) |
| 248 | Novellus Systems Inc. | Concept Three Altus | WCVD (Chemical Vapor Deposition) |
| 249 | Novellus Systems Inc. | Concept Three Altus | WCVD (Chemical Vapor Deposition) |
| 250 | Novellus Systems Inc. | Concept Three Speed MAX | HDP CVD (Chemical Vapor Deposition) |
| 251 | NPC incorporated | EL Inspection Machine | EL/PL Inspection |
| 252 | NPC incorporated | VARIOUS ASSEMBLIES | VARIOUS ASSEMBLIES |
| 253 | NPC incorporated | EL Inspection Machine | EL/PL Inspection |
| 254 | NPC incorporated | EL Inspection Machine | EL/PL Inspection |
| 255 | Olympus | AL3100 | Macro-Defect |
| 256 | Oxford Instruments | Plasmalab 80 Plus | Multi-Process Etch |
| 257 | Oxford Instruments | X-Strata980 | X-ray Fluorescence Spectrometer |
| 258 | P.S.K. Tech Inc. | Supra IV | Stripper/Asher |
| 259 | Plasma System Corp. | DES-220 | Stripper/Asher |
| 260 | Plasma System Corp. | SA-2000 | Stripper/Asher |
| 261 | Plasma-Therm I.P. Inc. | 790 Etch | Multi-Process Etch |
| 262 | ReVera | RVX1000 | Film Thickness Measurement System |
| 263 | ReVera | RVX1000 | Film Thickness Measurement System |
| 264 | Rigaku | MFM310 | X-ray Reflectivity (XRR) |
| 265 | Robert Bürkle GmbH | YPSATOR 2022-5S | Cooling Press |
| 266 | Robert Bürkle GmbH | YPSATOR 2022-5S | Cooling Press |
| 267 | Robert Bürkle GmbH | RCF-12M1800 | Roller Coater |
| 268 | Rudolph Technologies, Inc. | NSX 105 | Macro-Defect |
| 269 | Rudolph Technologies, Inc. | NSX 105 | Macro-Defect |
| 270 | Rudolph Technologies, Inc. | NSX 105 | Macro-Defect |
| 271 | Rudolph Technologies, Inc. | NSX 105 | Macro-Defect |
| 272 | Rudolph Technologies, Inc. | NSX 105 | Macro-Defect |
| 273 | Rudolph Technologies, Inc. | NSX 105 | Macro-Defect |
| 274 | Rudolph Technologies, Inc. | S3000A | Ellipsometer |
| 275 | Rudolph Technologies, Inc. | S3000A | Ellipsometer |
| 276 | Rudolph Technologies, Inc. | S3000A | Ellipsometer |
| 277 | S.E.S. CO., LTD. | BW3000X | Batch Wafer Processing |
| 278 | S.E.S. CO., LTD. | BW3000X | Batch Wafer Processing |
| 279 | Semiconductor Equipment Corp.(SEC) | Model 860 Eagle | Flip Chip Bonder |
| 280 | Semitool Inc. | Raider ECD310 | ECD (Electro Chemical Deposition) |
| 281 | Semitool Inc. | Raider SP | Single Wafer Processing |
| 282 | Semitool Inc. | Raider ECD | ECD (Electro Chemical Deposition) |
| 283 | SEZ Group | DV-34 | Single Wafer Processing |
| 284 | Shibaura Engineering Works Ltd. | CDE-300 | Metal Etch |
| 285 | Showa Denko | abatement series | Chemical/Gas Treatment System |
| 286 | SilverStone Technology Co | SST-ST45SF | PC Power Supplies |
| 287 | SINGULUS TECHNOLOGIES AG | SILEX II CLEANTEX 2800 | Etch |
| 288 | SINGULUS TECHNOLOGIES AG | SILEX II CLEANTEX 2800 | Etch |
| 289 | SINGULUS TECHNOLOGIES AG | SILEX II CLEANTEX 2800 | Etch |
| 290 | SINGULUS TECHNOLOGIES AG | SILEX II CLEANTEX 2800 | Etch |
| 291 | SINGULUS TECHNOLOGIES AG | SILEX II CLEANTEX 2800 | Etch |
| 292 | SINGULUS TECHNOLOGIES AG | SILEX II CLEANTEX 2800 | Etch |
| 293 | SINGULUS TECHNOLOGIES AG | SILEX II CLEANTEX 2800 | Etch |
| 294 | SINGULUS TECHNOLOGIES AG | SILEX II CLEANTEX 2800 | Etch |
| 295 | SINGULUS TECHNOLOGIES AG | SILEX II DHF 5600 | Etch |
| 296 | SINGULUS TECHNOLOGIES AG | SILEX II DHF 5600 | Etch |
| 297 | SINGULUS TECHNOLOGIES AG | SILEX II DHF 5600 | Etch |
| 298 | SINGULUS TECHNOLOGIES AG | SILEX II DHF 5600 | Etch |
| 299 | SINGULUS TECHNOLOGIES AG | SILEX II DHF 5600 | Etch |
| 300 | SINGULUS TECHNOLOGIES AG | SILEX II ISOEDGE 5600 | Etch |
| 301 | SINGULUS TECHNOLOGIES AG | SILEX II ISOEDGE 5600 | Etch |
| 302 | SINGULUS TECHNOLOGIES AG | SILEX II ISOEDGE 5600 | Etch |
| 303 | SINGULUS TECHNOLOGIES AG | SILEX II ISOEDGE 5600 | Etch |
| 304 | SINGULUS TECHNOLOGIES AG | SILEX II ISOEDGE 5600 | Etch |
| 305 | SINGULUS TECHNOLOGIES AG | SILEX II DHF 5600 | Etch |
| 306 | SINGULUS TECHNOLOGIES AG | SILEX II CLEANTEX 2800 | Etch |
| 307 | Sokudo Co., Ltd. | RF-300A | Multi Block (Resist Coater/Developer) |
| 308 | Standard Research Systems | SR560 — Low-noise voltage preamplifier | Parts/Peripherals |
| 309 | Steag Industrie AG | ASC-5500 | Reticle Cleaner |
| 310 | Sun Yang Tech Sdn Bhd | AFR-01 | Strip Sorter |
| 311 | Sun Yang Tech Sdn Bhd | AFR-01 | Strip Sorter |
| 312 | Sun Yang Tech Sdn Bhd | AFR-01 | Strip Sorter |
| 313 | TDK | AFM-1505 | Flip Chip Bonder |
| 314 | TDK | AFM-1505 | Flip Chip Bonder |
| 315 | TDK | AFM-1505 | Flip Chip Bonder |
| 316 | TDK | AFM-1505 | Flip Chip Bonder |
| 317 | TDK | AFM-1505 | Flip Chip Bonder |
| 318 | TDK | AFM-1505 | Flip Chip Bonder |
| 319 | TDK | AFM-1503 | Flip Chip Bonder |
| 320 | TDK | AFM-1503 | Flip Chip Bonder |
| 321 | TDK | AFM-1503 | Flip Chip Bonder |
| 322 | TDK | AFM-1503 | Flip Chip Bonder |
| 323 | TDK | AFM-1503 | Flip Chip Bonder |
| 324 | TDK | AFM-1503 | Flip Chip Bonder |
| 325 | TDK | AFM-1503 | Flip Chip Bonder |
| 326 | TDK | AFM-1503 | Flip Chip Bonder |
| 327 | TDK | AFM-1505 | Flip Chip Bonder |
| 328 | TDK | AFM-1505 | Flip Chip Bonder |
| 329 | Tecdia Inc. | TEC-1228AL | Wafer Breaker |
| 330 | Technos | TVD-900 ICP-MS | Spectrometry |
| 331 | Teradyne, Inc. | Magnum V SSV (FT) | Memory Tester |
| 332 | Thermaltake Technology | Toughpower 750W Gold | PC Power Supplies |
| 333 | Tokyo Electron Ltd. (TEL) | Telius 305 SCCM | Dielectric Etch |
| 334 | Tokyo Electron Ltd. (TEL) | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) |
| 335 | Tokyo Electron Ltd. (TEL) | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) |
| 336 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 337 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 338 | Tokyo Electron Ltd. (TEL) | Trias W | MOCVD |
| 339 | Tokyo Electron Ltd. (TEL) | Trias W | MOCVD |
| 340 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 341 | Tokyo Electron Ltd. (TEL) | Telius SP-305 SCCM | Dielectric Etch |
| 342 | Tokyo Electron Ltd. (TEL) | Telius SP-305 SCCM | Dielectric Etch |
| 343 | Tokyo Electron Ltd. (TEL) | Telius SP-305 SCCM | Dielectric Etch |
| 344 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 345 | Tokyo Electron Ltd. (TEL) | Cellesta+ | Single Wafer Processing |
| 346 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 347 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 348 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 349 | Tokyo Electron Ltd. (TEL) | Tactras RLSA Poly | Polysilicon Etch |
| 350 | Tokyo Electron Ltd. (TEL) | TELFORMULA Nitride | Vertical Furnace |
| 351 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 352 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 353 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 354 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 355 | Tokyo Electron Ltd. (TEL) | TELFORMULA Nitride | Vertical Furnace |
| 356 | Tokyo Electron Ltd. (TEL) | TELINDY Plus IRAD Oxide | Vertical Furnace |
| 357 | Tokyo Electron Ltd. (TEL) | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) |
| 358 | Tokyo Electron Ltd. (TEL) | TELINDY OXIDE | Vertical Furnace |
| 359 | Tokyo Electron Ltd. (TEL) | TELINDY Plus ALD High-K | Vertical Furnace |
| 360 | Tokyo Electron Ltd. (TEL) | Tactras Vigus RK3 – Chamber Only | Dielectric Etch |
| 361 | Tokyo Electron Ltd. (TEL) | Trias W – Chamber Only | Metal CVD (Chemical Vapor Deposition) |
| 362 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 363 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 364 | Tokyo Electron Ltd. (TEL) | TELFORMULA Nitride | Vertical Furnace |
| 365 | Tokyo Electron Ltd. (TEL) | Trias W | MOCVD |
| 366 | Tokyo Electron Ltd. (TEL) | ALPHA-303i Nitride | Vertical Furnace |
| 367 | Tokyo Electron Ltd. (TEL) | ALPHA-303i Nitride | Vertical Furnace |
| 368 | Tokyo Electron Ltd. (TEL) | ALPHA-303i Oxide | Vertical Furnace |
| 369 | Tokyo Electron Ltd. (TEL) | ALPHA-303i Oxide | Vertical Furnace |
| 370 | Tokyo Electron Ltd. (TEL) | TELFORMULA Nitride | Vertical Furnace |
| 371 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 372 | Tokyo Electron Ltd. (TEL) | TELFORMULA Nitride | Vertical Furnace |
| 373 | Tokyo Electron Ltd. (TEL) | TELFORMULA Nitride | Vertical Furnace |
| 374 | Tokyo Electron Ltd. (TEL) | TELINDY Nitride | Vertical Furnace |
| 375 | Tokyo Electron Ltd. (TEL) | ALPHA-303i Anneal | Vertical Furnace |
| 376 | Tokyo Electron Ltd. (TEL) | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) |
| 377 | Tokyo Electron Ltd. (TEL) | Trias W | MOCVD |
| 378 | Tokyo Electron Ltd. (TEL) | ALPHA-303i Anneal | Vertical Furnace |
| 379 | Tokyo Electron Ltd. (TEL) | ALPHA-303i Nitride | Vertical Furnace |
| 380 | Tokyo Electron Ltd. (TEL) | ALPHA-303i Anneal | Vertical Furnace |
| 381 | Tokyo Electron Ltd. (TEL) | ALPHA-303i Anneal | Vertical Furnace |
| 382 | Tokyo Electron Ltd. (TEL) | ALPHA-303i TEOS | Vertical Furnace |
| 383 | Tokyo Electron Ltd. (TEL) | ALPHA-303i Anneal | Vertical Furnace |
| 384 | Tokyo Electron Ltd. (TEL) | ALPHA-303i Anneal | Vertical Furnace |
| 385 | Tokyo Electron Ltd. (TEL) | Triase+ EX-II Plus Ti/TiN | Metal CVD (Chemical Vapor Deposition) |
| 386 | Tokyo Electron Ltd. (TEL) | Telius 305 DRM | Dielectric Etch |
| 387 | Tokyo Electron Ltd. (TEL) | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) |
| 388 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 389 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 390 | Tokyo Electron Ltd. (TEL) | TELFORMULA | Vertical Furnace |
| 391 | Tokyo Electron Ltd. (TEL) | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) |
| 392 | Tokyo Electron Ltd. (TEL) | Trias Ti/TiN Chamber | Parts/Peripherals |
| 393 | Tokyo Electron Ltd. (TEL) | Trias Ti/TiN Chamber | Parts/Peripherals |
| 394 | Tokyo Electron Ltd. (TEL) | Expedius | Batch Wafer Processing |
| 395 | Tokyo Electron Ltd. (TEL) | Tactras Vesta | Polysilicon Etch |
| 396 | Tokyo Electron Ltd. (TEL) | TELFORMULA Nitride | Vertical Furnace |
| 397 | Tokyo Electron Ltd. (TEL) | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) |
| 398 | Tokyo Electron Ltd. (TEL) | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) |
| 399 | Tokyo Electron Ltd. (TEL) | TELFORMULA Nitride | Vertical Furnace |
| 400 | Tokyo Electron Ltd. (TEL) | TELFORMULA Nitride | Vertical Furnace |
| 401 | Tokyo Electron Ltd. (TEL) | Trias Ti/TiN Chamber | Parts/Peripherals |
| 402 | Tokyo Electron Ltd. (TEL) | TELFORMULA Nitride | Vertical Furnace |
| 403 | Tokyo Electron Ltd. (TEL) | ALPHA-303i Nitride | Vertical Furnace |
| 404 | Tokyo Electron Ltd. (TEL) | TELFORMULA ALD High-K | Vertical Furnace |
| 405 | Tokyo Electron Ltd. (TEL) | TELFORMULA Nitride | Vertical Furnace |
| 406 | Tokyo Electron Ltd. (TEL) | TELFORMULA Nitride | Vertical Furnace |
| 407 | Tokyo Electron Ltd. (TEL) | Telius SP-305 SCCM | Dielectric Etch |
| 408 | Tokyo Electron Ltd. (TEL) | ALPHA-303i Nitride | Vertical Furnace |
| 409 | Toyoko Kagaku | Toyoko Kagaku Fume Hood | Fume Hood Workstation |
| 410 | Ushio | UMA-2003 | UV Cure System |
| 411 | Varian Semiconductor Equipment Associates (VSEA) | VIISta PLAD | High Dose Implant |
| 412 | Varian Semiconductor Equipment Associates (VSEA) | VIISta PLAD | High Dose Implant |
| 413 | Various | Various | Parts/Peripherals |
| 414 | Various | Various | Parts/Peripherals |
| 415 | Veeco Instruments Inc. | Dimension 7000 | Atomic Force Microscope (AFM) |
| 416 | Veeco Instruments Inc. | Dimension X1D | Atomic Force Microscope (AFM) |
| 417 | Veeco Instruments Inc. | Dimension X1D | Atomic Force Microscope (AFM) |
| 418 | VISHAY | SI4162DY-T1-GE3 | SOIC-8 |
| 419 | VON ARDENNE | XEA NOVA | Coating Equipment |
| 420 | VON ARDENNE | XEA NOVA | Coating Equipment |
| 421 | VON ARDENNE | XEA NOVA | Coating Equipment |
| 422 | VON ARDENNE | XEA NOVA | Coating Equipment |
| 423 | Wentworth Laboratories | pegasus s300 | Engineering Wafer Prober |
| 424 | Zen Voce Corporation | BM388 | Solder Ball Mount |
ID-SS5319-0-9
